HIGHLIGHTS
- who: Admin from the Seongnam, Republic of Korea have published the paper: The Effect of Deposition Temperature of Thin Film Deposition Using Thermal Atomic Layer Deposition, in the Journal: Coatings 2023, 13, 104. of /2023/
- what: In this study the effect of deposition temperature of thin films deposited using the thermal atomic layer deposition (ALD) method was investigated. precursor and NH3 reactive gas were used and the deposition rate resistivity change and surface morphology characteristics were compared in the deposition temperature range of 400 u00b0C-600u00b0C. While resistivity decreased to 177 u03bcu03a9cm as the deposition . . .
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