HIGHLIGHTS
- who: Baek-Ju Lee and colleagues from the Seongnam, Republic of Korea have published the research: The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition, in the Journal: Coatings 2023, 13, 104. of /2023/
- what: In this study the effect of deposition temperature of thin films deposited using the thermal atomic layer deposition (ALD) method was investigated. precursor and NH3 reactive gas were used and the deposition rate resistivity change and surface morphology characteristics were compared in the deposition temperature range of 400 u25e6 C-600 u25e6 C. While . . .
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