HIGHLIGHTS
- who: Marietta Seifert et al. from the (UNIVERSITY) have published the research work: The Influence of the Composition of Ru100-xAlx (x = 50,55,60,67) Thin Films on Their Thermal Stability, in the Journal: (JOURNAL)
SUMMARY
During its annealing at high temperature, Al gets oxidized even under high vacuum conditions and a 15-20 nm thick Al2 O3 layer is formed at the sample surface (annealing temperature: 800 ◦ C, annealing time: 10 h). Investigation of the oxidation behavior of thicker RuAl films (200-600 nm) as well as of bulk samples reveal . . .
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