The reflectance characteristics of an inverse moth-eye structure in a silicon substrate depending on sf6/o2 plasma etching conditions

HIGHLIGHTS

• who: Jong-Chang Woo and Doo-Seung Um from the Department of Semiconductor Process Equipment, Semiconductor Convergence Campus of Department of Electrical Engineering, Sejong University, Seoul , have published the paper: The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions, in the Journal: Micromachines
• what: This study investigated the effect of process variables on the surface reflectance of silicon-based inverse moth-eye structures.
• how: In this study the surface change due to the SF6/O2 gas mixing ratio upper power and process . . .
  

   

  

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