Tunable biaxial strain device for low-dimensional materials

HIGHLIGHTS

• who: Vincent Pasquier and collaborators from the Universitu00e9 de Genu00e8ve, Quai Ernest Ansermet, Geneva, Switzerland have published the paper: Tunable biaxial strain device for low-dimensional materials, in the Journal: (JOURNAL)
• what: We have demonstrated a unique device capable of applying a uniform in-plane biaxial strain in excess of 1.1% to low-dimensional single crystals and small devices.

SUMMARY

II. The device features two innovations: the authors introduce a four-points pusher (Fig 2) that yields a larger region of uniform biaxial strain at the center of the substrate . . .

 



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