HIGHLIGHTS
- who: Light trapping and collaborators from the (UNIVERSITY) have published the Article: Ultradense and planarized antireflective vertical silicon nanowire array using a bottom-up technique, in the Journal: (JOURNAL)
- what: The authors show that a combination of ultrasonic agitation, gold-chemical etching, and silicon plasma etching enables the achievement of high-density arrays of silicon nanowires with a very good length control and homogeneity on a silicon substrate.
SUMMARY
Of the density and localization of the metallic catalyst seeds. If the substrate is not oriented in the preferential growth direction, it . . .
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