Uv and ir laser induced ablation of al2o3/sin:h and a-si:h/sin:h

HIGHLIGHTS

• who: Schutz-Kuchly T. and collaborators from the Laboratoire des sciences de l'Ingénieur, de l'Informatique et de l'Imagerie (ICUBE) UMR, UdS/CNRS, rue du Loess, BP , CR, Strasbourg , France have published the research: UV and IR laser induced ablation of Al2O3/SiN:H and a-Si:H/SiN:H, in the Journal: (JOURNAL)
• what: IR femtosecond and UV nanosecond lasers were investigated for the ablation of thin Al2 O3 (20 nm)/SiN:H
• how: Same observation can be made when the fluence value is increased.

SUMMARY

 



If you want to have access to all the content you need to log in!

Thanks :)

Username or Email

Password

Remember me

Lost your password?

If you don't have an account, you can create one here.