HIGHLIGHTS
- What: In Fig 14(c), the authors show the retrieved OV with the zeroth order filtered from the measurement and a RoI equal to the 2 × 2 μm2 grating size.
- Who: Paper et al. from the Advanced Research Center for Nanolithography, Amsterdam, The Netherlands have published the Article: Enhancing diffraction-based overlay metrology capabilities in digital holographic microscopy using model-based signal separation, in the Journal: (JOURNAL)
- How: Previous presented experimental results were obtained using on 16 × 16 μm2 overlay targets. The authors presented two experimental examples of different types of pupil filtering . . .
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